52.6
[1]. Ramasamy Pothiraja, et al. Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films. Dalton Trans. 29 Jan 28:():65-6.
P21-P2-P2-P21-P22-P2-P28-P7+P78-P51
GHS2
272
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质量 (g) = 浓度 (mol/L) × 体积 (L) × (g/mol)